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Cholley® Relaxing & After Sun Mask 30% off

Cholley® Relaxing & After Sun Mask 30% off

HK$1,050.00
HK$735.00
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Description

MOC708V
容量 : 50ml

有效成份 : 菩提樹、迷迭香、馬尾粟、氨基酸、透明質酸、熊果素  

特別針對受外界環境侵略(如風吹日曬或污染)而受損害的肌膚。能舒緩曬後紅腫及微細血管浮現症
狀,修補受傷或脆弱肌膚,讓肌膚回復柔潤亮麗。可作面膜或面霜使用。(面、頸及胸前適用)

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